Part # NN-EEUSNP-W100(10,10)
|NanoProbe Length (µm)||10||8-13|
|Tip radius of curvature (nm)||50||25 -100|
|NanoProbe electrical resistivity (Ωm)||1.05×10-7||1 - 1.1 ×10-7|
|Electrical resistance (Ω)||30||15 - 45|
|Lateral deflection tolerance (nm)||500||300-1000|
|Current tolerance (mA)||5||1 - 10|
|Insulation coating thickness||200 nm||150 to 250 nm|
|Background current leakage||<10 pA||0-10 pA|
|Diffusion-limited value on CV measurement||200 pA||150 to 300 pA|
|Substrate Material||Tungsten Wire||Per request, other substrate (e.g. Pt/Ir) can be provided|
|Substrate Dimension||20 mm (L) × 100 µm (D)||Per request, different wire length (e.g. 5 to 25 mm) can be provided|
|Number of NanoProbes||10 NanoProbes|
Exposed End Ultra Sharp NeedleProbe (EEUSNP)
NaugaNeedles introduces a new exposed end nano-electrodes on their USNPTM probes. The basic structure of these probes is the tungsten probe with a high aspect ratio Nanoneedle. The entire probe is sealed with Parylene and exposed at the very end of the Nanoneedle and exchanged with platinum. To avoid any possible leakage a heat-shrink and epoxy is covering the trunk of the tungsten probe. These probes make it possible to perform transport measurement by a nano-electrode (the platinum tip) under liquid. They are easy to mount in different manipulator, probe station and STM.
a) Schematic of device, b) Finished product grabbed by tweeter, c) SEM image of the needle and exposed tip, d) Optical image of the tip, and e) CV curve of the tested device.